Chemical Vapor Deposition Online Training

WBT010 - 2.00 Hours

Schedule

  • EC  WBT010  141
    $24.95

Description

This online course focuses on chemical vapor deposition (CVD) and is designed to provide professionals in the semiconductor industry with information on CVD, a means of depositing a very thin film on a wafer surface. This module describes the process of CVD and its key quality issues.

Objectives

At the end of this course the learner will be able to identify:

  • the purpose of CVD
  • six methods of CVD
  • the use of APCVD
  • the use of LPCVD
  • the use of PECVD
  • the use of PHCVD and LCVD
  • key quality characteristics and process parameters for CVD

Prerequisites

There are no prerequisites for this course.

Topics

Five methods of CVD +Key quality characteristics and process parameters for CVD +Purpose of chemical vapor deposition +The use of atmospheric pressure chemical vapor deposition +The use of low pressure chemical vapor deposition +The use of photon-enhanced chemical vapor deposition and laser-enhanced chemical vapor deposition +The use of plasma-enhanced chemical vapor deposition

Suggested Audience

  • New hires in the semiconductor fab
  • Equipment technicians
  • Wafer fab equipment operators
  • Sales support
  • Entry-level engineers
  • Anyone interested in learning more about the semiconductor industry

Continuing Education & Professional Credits

    Other Information

    This course fee entitles you to a 90-day subscription during which you can take the course at your own pace. The online course can be taken in sections of your choosing and does not have to be completed during any one session.

    Please call customer service at 1-800-541-7149 for more information or email us at ke@teex.tamu.edu Call 1-800-541-7149 for volume discounts and license options for your organization.

    Contact Information

    Knowledge Engineering
    Phone: (979) 458-6710 | Tollfree: (800) 541-7149

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