WBT010 – 2.00 Hours

Schedule

EC WBT010 143$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Monday, October 01, 2018

EC WBT010 144$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Thursday, November 01, 2018

EC WBT010 145$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Saturday, December 01, 2018

EC WBT010 146$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Tuesday, January 01, 2019

EC WBT010 147$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Friday, February 01, 2019

This schedule is subject to change without notice. If you have not received confirmation of the class prior to the class start, please contact the division at (800) 541-7149 or ke@teex.tamu.edu to get the latest schedule.

Course Description

This online course focuses on chemical vapor deposition (CVD) and is designed to provide professionals in the semiconductor industry with information on CVD, a means of depositing a very thin film on a wafer surface. This module describes the process of CVD and its key quality issues.

Objectives

At the end of this course the learner will be able to identify:

  • the purpose of CVD
  • six methods of CVD
  • the use of APCVD
  • the use of LPCVD
  • the use of PECVD
  • the use of PHCVD and LCVD
  • key quality characteristics and process parameters for CVD

Prerequisites

There are no prerequisites for this course.

Attendance Requirements

To meet attendance requirements, participants must review each training module and complete all required course assignments, activities, quizzes, and/or end of course exam.

Topics

  • Five methods of CVD
  • Key quality characteristics and process parameters for CVD
  • Purpose of chemical vapor deposition
  • The use of atmospheric pressure chemical vapor deposition
  • The use of low pressure chemical vapor deposition
  • The use of photon-enhanced chemical vapor deposition and laser-enhanced chemical vapor deposition
  • The use of plasma-enhanced chemical vapor deposition

Suggested Audience

  • New hires in the semiconductor fab
  • Equipment technicians
  • Wafer fab equipment operators
  • Sales support
  • Entry-level engineers
  • Anyone interested in learning more about the semiconductor industry

Other Information

This course fee entitles you to a 90-day subscription during which you can take the course at your own pace. The online course can be taken in sections of your choosing and does not have to be completed during any one session.

Please call customer service at 1-800-541-7149 for more information or email us at ke@teex.tamu.edu

Call 1-800-541-7149 for volume discounts and license options for your organization.

Contact Information

Knowledge Engineering
Phone: (979) 458-6710 | Toll-Free: (800) 541-7149
Email: ke@teex.tamu.edu

Policies

TEEX Policies

Definitely was one of the best learning experiences I have ever had.

— Death Investigation
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