WBT011 – 2.00 Hours

Schedule

EC WBT011 146$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Thursday, November 01, 2018

EC WBT011 147$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Saturday, December 01, 2018

EC WBT011 148$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Tuesday, January 01, 2019

EC WBT011 149$24.95Register

Address

TEEX-Internet Moodle Campus

Texas A&M University Systems Building
College Station, TX 77845

Instructor

Scott (Richard) Terry

Start Time

12:01 AM Friday, February 01, 2019

This schedule is subject to change without notice. If you have not received confirmation of the class prior to the class start, please contact the division at (800) 541-7149 or ke@teex.tamu.edu to get the latest schedule.

Course Description

This online course focuses on photolithography and is designed to provide professionals in the semiconductor industry with information on photolithography, the transfer of tiny, complex circuit designs onto the surface of a wafer. This module describes the process of photolithography and its key quality issues.

Objectives

At the end of this course the learner will be able to identify:

  • the purpose of photolithography
  • the four basic process steps of photolithography
  • the steps of wafer coating
  • the types of photoresists
  • four types of exposure systems commonly used in the fabrication of integrated circuits
  • three types of advanced exposure systems
  • the development stage for photolithography
  • the inspection stage for photolithography
  • important process parameters that are critical to photolithography
  • the two major quality issues of photolithography

Prerequisites

There are no prerequisites for this course.

Attendance Requirements

To meet attendance requirements, participants must review each training module and complete all required course assignments, activities, quizzes, and/or end of course exam.

Topics

  • The purpose of photolithography
  • Four basic process steps of photolithography
  • The steps of wafer coating
  • The types of photo resists
  • Four types of exposure systems commonly used in the fabrication of integrated circuits
  • Three types of advanced exposure systems
  • The development stage for photolithography
  • The inspection stage for photolithography
  • Important process parameters that are critical to photolithography
  • Two major quality issues of photolithography

Suggested Audience

  • New hires in the semiconductor fab
  • Equipment technicians
  • Wafer fab equipment operators
  • Sales support
  • Entry-level engineers
  • Anyone interested in learning more about the semiconductor industry

Other Information

The course fee entitles you to a 90-day subscription during which you can take the course at your own pace. The online course can be taken in sections of your choosing and does not have to be completed during any one session.

Call (800) 541-7149 for volume discounts and license options for your organization, or email us at ke@teex.tamu.edu

Contact Information

Knowledge Engineering
Phone: (979) 458-6710 | Toll-Free: (800) 541-7149
Email: ke@teex.tamu.edu

Policies

TEEX Policies

This was an excellent course.

— Death Investigation
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