SCP005 – 8.00 Hours
Currently there are no scheduled classes for this course. However, in some cases a course can be scheduled to meet your organization’s specific needs. For more information about this course or to schedule a class, please contact Business & Cyber Solutions at or firstname.lastname@example.org to get the latest schedule.
The seminar on Ion Implantation provides an overview of equipment issues, process parameters and key quality control issues. Emphasis is placed on the advantages of ion implantation types of source elements used, selection of the proper ion species, maintenance of high vacuum on the implanter, beam focusing, scanning systems, and end point detection. Process issues related to silicon crystal orientation, channeling, trench processing, implant depth, metrology, and post implant annealing are included. Download the in-depth course description.
There are no prerequisites for this course.
To meet attendance requirements, participants must review each training module and complete all required course assignments, activities, quizzes, and/or end of course exam.
- Annealing methods
- Implant depth
- Implantation process
- Introduction to ion implantation
- Ion implantation equipment and sub assemblies
- Material considerations
- Process control
- Scanning techniques
- Source compounds
Those of all skill levels having an interest in an introduction to ion implantation processes.
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